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Defect Review SEM RS-5000 series
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Defect Review SEM supports High Yield in 45 nm generation
and beyond.
It is an automated in-line Defect Review SEM and ideal for improving yield and achieving faster ramp-ups toward high volume semiconductor device manufacturing operations.
RS-5000 series has superior image quality and contrast, high throughput ADR (Automatic Defect Review) and high accuracy ADC (Automatic Defect Classification). ADR for unpatterned wafers, process monitoring and Intelligent Sampling are available as optional functions.
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Electron Beam Wafer Inspection System I-5320 / I-6300
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High speed and high sensitivity EB wafer inspection system
for 45 nm and beyond.
New electron optics and advanced image processing system have realized high speed
and high sensitivity inspection as well as excellent measurement repeatability
with enhanced VC (Voltage Contrast).
Real-time Automatic Defect Classification function is also available.
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Wafer Surface Inspection System LS6800
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LS6800 are capable of detecting smaller than 40 nm defects
on unpatterned wafers with high sensitivity and throughput. Those tools support
yield enhancement through high precision discrimination and detection of COP defects,
particles, CMP scratches and particles.
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Dark Field Wafer Defect Inspection System IS3000 |
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Dark field wafer inspection system for 45 nm generation
- Effective for yield enhancement by the high sensitivity / high speed inspection capabilities.
- Superior cost effective inspection tool.
- DFC (Dark field real time classification)
- Recipe set up in minutes.
- Precise coordinate system for SEM review.
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