Metrology

High performance CD-SEM for 45nm / 32nm generation and beyond.
Basic performance has been enhanced through the entirely improved platform of its predecessor S-9380 series CD-SEM to achieve an ever higher level of measurement accuracy. High accuracy process monitor, DBM (Design Based Metrology), and off-line recipe creation are available in conjunction with Hitachi "DesignGauge" system (option). We assure our customers of our continued support in yield enhancement by the newly introduced CG4000 CD-SEM for 45nm / 32nm generation and beyond.

Design Based Metrology System "DesignGauge" runs on a Windows^(R) PC and can be connected with Hitachi CD-SEMs (S-9380II/CG4000) via an Ethernet connection to realize the new application, such as OPC* validation and off line recipe creation by using design data.
*OPC : Optical Proximity Correction

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