Metrology & Inspection

Advanced High Resolution CD-SEM CG5000 New !

New CD-SEM designed for sub-22nm technology node and beyond.

The CD-Measurement SEM CG4100

CD-SEM for 32nm technology node and beyond.

Design Based Metrology System DesignGauge Series

RecipeDirector:CD-SEM recipe automatic creation utilizing design data
DesignGauge-Analyzer:Supporting OPC evaluation and optimizing pattern measurement in Lithography process

Defect Review SEM Inspago RS6000 Series

Inline Review SEM to contribute to next generation by high speed ADR and accurate ADC

Wafer Surface Inspection System LS Series

Wafer surface inspection system to detect any type of small defects on non-patterned wafer of next generation device

Dark Field Wafer Defect Inspection System IS Series

Delivering high detection sensitivity and high inspection throughput enabling yield improvement and production cost reduction