FE-SEM (Field Emission Scanning Electron Microscope)

Like no other SEM in the world...

Hitachi, pioneer of the semi-in-lens FE-SEM, is proud to introduce a new signal detection system. Secondary and Backscattered electron signal collection efficiency and flexibility to mix and filter signals have been greatly improved by New Top detector, especially at low and ultra low voltages.

Newly designed semi-in-lens system utilized in the S-4800 FE-SEM, can achieve in-lens FE-SEM performance specifications. Observation for standard 6inch or (Optional) 8inch wafer is possible.

The S-4300 offers excellent resolution capabilities of 1.5nm at 15kV and an impressive 5.0nm at just 1 kV. The S-4300 also features an integral image management processing & archiving system, which allows up to 40 thumbnail images to be displayed simultaneously.

Model SU-70 is a new concept SEM incorporating field proven Hitachi’s semi-in-lens technology for ultra high resolution, and Schottky electron gun. It features not only ultra high resolution (1.0 nm/15kV, 1.6nm*/1 kV), but also observation of charge-up reduced image, compositional contrast image, ultra-low accelerating voltage image*, benefiting from highly-reputed Super ExB function. The Schottky electron gun enables to deal with wide variety of analytical work (EDX*, WDX*, EBSP*, etc) thanks to its 100 nA probe current. (*option)

It utilizes advanced Variable Pressure(VP) technology and allows accommodation of EDX,WDX and EBSP system for versatile material analyses in addition to high resolution imaging and materials characterization. The VP mode allows the operator to change vacuum conditions in the sample chamber from high vacuum to low vacuum.