Skip to header Hitachi High-Technologies
 News & Events       Sitemap

 Go HITACHI Top
global navigation start   | Home | About Us | Investor Relations | Global Network |  Products & Services | Customer Service |


page title

FE-SEM (Field Emission Scanning Electron Microscope)
starting of main content
 
 

Ultra-high Resolution Scanning Electron Microscope SU9000
 
SU9000 Designed for high resolution imaging, even for beam sensitive specimens and advanced semiconductor devices that require stable observation at magnifications up to 3,000,000 times.
  • New electron gun and optics designed for enhanced low kV performance.
    • 0.4nm at 30kV (SE)
    • 1.2nm at 1kV (SE)
    • 0.34nm at 30kV (STEM)
  • High throughput cross section observation with improved high vacuum capability and unparalleled beam stability.
  • Efficient and flexible SE/BSE/STEM signal collection along with a newly designed Super E x B energy filtering technology.

 more detail

 
 

Ultra-high Resolution Scanning Electron Microscope SU8000 Family
(SU8010/SU8020/SU8030/SU8040)
 
SU8000 Family SU8000 family has excellent features in common, like ultra high resolution imaging technology (1.3nm/1.0kV), wide ranges of signal detecting system, and user-friendly operetionality. SU8000 family offers variety of stages, chambers and signal detecting systems to meet the wide variety of customer-specific needs of ultra high resolution microscopy.
  • ultra high resolution imaging capability
    • Resolution :1.0nm / 15kV, 1.3nm / 1kV
    • Magnification :80x to 2,000,000x
  • a wide range of signal detection
  • User-friendly operation for multi-user facilities
  • a range of stages, chambers and configurations to meet the wide variety of customer-specific needs for tomorrow's ultra high resolution microscopy.

 more detail

 
 

Analytical UHR Schottky Emission Scanning Electron Microscope SU-70
 
SU-70 Model SU-70 is a new concept SEM incorporating field proven Hitachi's semi-in-lens technology for ultra high resolution, and Schottky electron gun. It features not only ultra high resolution (1.0 nm/15kV, 1.6nm*/1 kV), but also observation of charge-up reduced image, compositional contrast image, ultra-low accelerating voltage image*, benefiting from highly-reputed Super ExB function. The Schottky electron gun enables to deal with wide variety of analytical work (EDX*, WDX*, EBSP*, etc) thanks to its 100 nA probe current. (*option)

     more detail

     
     

    Analytical Variable Pressure Scanning Electron Microscope SU6600
     
    SU6600 It utilizes advanced Variable Pressure(VP) technology and allows accommodation of EDX,WDX and EBSP system for versatile material analyses in addition to high resolution imaging and materials characterization. The VP mode allows the operator to change vacuum conditions in the sample chamber from high vacuum to low vacuum.
    • Electron gun : ZrO/W Schottky emission electron source
    • Resolution : 1.2nm/30kV, 3.0nm/1kV
    • Probe current : 1pA~200nA
    • Specimen chamber pressure : 10-4Pa (high vacuum), 10~300Pa (low vacuum)
    • Specimen Size:Max150mm dia.×40mm H

     more detail

     
     
    ending of main content
    Search by Google

     > Advanced Search
    starting of secondary navigation
    TEM / SEM / FIB

    (S)TEM

    FIB

    FE-SEM

    SEM

    Tabletop Microscope

    Nano-Probing System

    Peripheral Device

    Contact Us
    ending of secondary navigation
     
    IEEE Milestone
    page top
    starting of footer  | Terms of use | Privacy Policy | All Rights Reserved Copyright (C) 2001, 2012. Hitachi High-Technologies Corporation.