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FE-SEM (Field Emission Scanning Electron Microscope)

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Ultra-high Resolution Scanning Electron Microscope SU9000

 
Ultra-high Resolution Scanning Electron Microscope SU9000 Designed for high resolution imaging, even for beam sensitive specimens and advanced semiconductor devices that require stable observation at magnifications up to 3,000,000 times.
  • New electron gun and optics designed for enhanced low kV performance.
    • 0.4nm at 30kV (SE)
    • 1.2nm at 1kV (SE)
    • 0.34nm at 30kV (STEM)
  • High throughput cross section observation with improved high vacuum capability and unparalleled beam stability.
  • Efficient and flexible SE/BSE/STEM signal collection along with a newly designed Super E x B energy filtering technology.

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Ultra-high Resolution Scanning Electron Microscope SU8200 Series

 
Ultra-high Resolution Scanning Electron Microscope SU8200 Series This novel CFE gun employs a Hitachi patented "Mild flashing" technique and a new vacuum system which greatly minimizes gas molecule deposition on the emitter tip. The emitter always operates in a "clean" state, and emission current and beam stability are significantly improved. The result is the ultimate SEM electron source offering high S/N, stability, and uncompromising resolution performance at low acceleration voltages.
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    Ultra-high Resolution Scanning Electron Microscope SU8000 Family
    (SU8010/SU8020/SU8030/SU8040)

     
    Ultra-high Resolution Scanning Electron Microscope SU8000 Family SU8000 family has excellent features in common, like ultra high resolution imaging technology (1.3nm/1.0kV), wide ranges of signal detecting system, and user-friendly operetionality. SU8000 family offers variety of stages, chambers and signal detecting systems to meet the wide variety of customer-specific needs of ultra high resolution microscopy.
    • ultra high resolution imaging capability
      • Resolution :1.0nm / 15kV, 1.3nm / 1kV
      • Magnification :80x to 2,000,000x
    • a wide range of signal detection
    • User-friendly operation for multi-user facilities
    • a range of stages, chambers and configurations to meet the wide variety of customer-specific needs for tomorrow's ultra high resolution microscopy.

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    Analytical UHR Schottky Emission Scanning Electron Microscope SU-70

     
    Analytical UHR Schottky Emission Scanning Electron Microscope SU-70 Model SU-70 is a new concept SEM incorporating field proven Hitachi's semi-in-lens technology for ultra high resolution, and Schottky electron gun. It features not only ultra high resolution (1.0 nm/15kV, 1.6nm*/1 kV), but also observation of charge-up reduced image, compositional contrast image, ultra-low accelerating voltage image*, benefiting from highly-reputed Super ExB function. The Schottky electron gun enables to deal with wide variety of analytical work (EDX*, WDX*, EBSP*, etc) thanks to its 100 nA probe current. (*option)

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    Analytical Variable Pressure Scanning Electron Microscope SU6600

     
    Analytical Variable Pressure Scanning Electron Microscope SU6600 It utilizes advanced Variable Pressure(VP) technology and allows accommodation of EDX,WDX and EBSP system for versatile material analyses in addition to high resolution imaging and materials characterization. The VP mode allows the operator to change vacuum conditions in the sample chamber from high vacuum to low vacuum.
    • Electron gun : ZrO/W Schottky emission electron source
    • Resolution : 1.2nm/30kV, 3.0nm/1kV
    • Probe current : 1pA~200nA
    • Specimen chamber pressure : 10-4Pa (high vacuum), 10~300Pa (low vacuum)
    • Specimen Size:Max150mm dia.×40mm H

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