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Bringing the advances of SEM to the forefront
Technological advances in the Semiconductor Industry are occurring at a rapid pace and pushing design and manufacturing tolerances to the nano-scale. These advances require direct observation of the surface structures of the materials at this size scale. Hitachi has a proven track record for providing cutting edge instrumentation that are reliable and that meet the strict imaging requirements of the Semiconductor Industry. |
Hitachi has now introduced a new line of instruments with improved CFE gun technologies that further reduce the already low aberration artifacts of existing Hitachi CFE technology. The new CFE Gun technology featured in the SU9000 achieves the highest SEM resolution in the world. (0.4nm at 30kV) The reduced aberration effects make high resolution, low accelerating voltage observations possible for beam sensitive materials without the need for deceleration technology. (1.2nm at 1kV )
The SU9000 also features STEM (option) performance that guarantees 0.34nm resolution as confi rmed through the imaging of graphite lattice ( (002) d=0.34nm) Hitachi is bringing superior fundamental performance such as stable operation, high throughput, and high resolution to the forefront of technology.
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The world highest resolution featured in the SU9000:
30kV acceleration voltage condition, has been implemented as of April, 2011 |
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Features |
- Superior low-kV performance for observation of beam sensitive materials.
- Next generation Hitachi In-lens SEM optics allows for routine observation at 1 million times.
- Newly designed CFE GUN provides high brightness and extremely stable emission current.
- Improved vacuum technology that allows for ultra-high vacuum levels for reduced sample contamination.
- Highly engineered instrument enclosure featuring both superior strength and stability to allow for high resolution imaging in a broad range of environmental conditions.
- Newly designed objective lens provides for high resolution imaging at low acceleration voltage.
- Side entry sample exchange system increases throughput by reducing the time required to change samples and by automatically positioning the sample at the correct WD.
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Specifications |
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Items |
Description |
| Resolution |
SE image resolution |
0.4nm (30kV, Sample Height=1.0mm, 800kx)
1.2nm (1kV, Sample Height=2.0mm, 250kx) |
| STEM image resolution |
0.34nm (30kV, Sample Height=0.0mm, Lattice image) |
| Magnification |
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Mag on Photo(*1) |
Mag on Display(*2) |
| LM Mode |
80 - 10,000x |
220 - 25,000x |
| HM Mode |
800 - 3,000,000x |
2,200 - 8,000,000x |
| Electron optics |
Electron gun |
Cold cathode field emission source |
| Accelerating voltage |
0.5 - 30kV (0.1kV step ) |
| Lens system |
3-stage electromagnetic lens reduction |
| Objective lens aperture |
Movable aperture (heating type. 4 openings selectable from outside of vacuum with fine adjustment) |
| Electrical image sift |
±5µm (Sample Height = 0.0mm) |
| Beam blanking |
Electrostatic type (synchronized with scanning signal) |
| Specimen stage |
Stage |
Side entry goniometer stage |
| Stage traverse |
X: ±4.0mm, Y: ±2.0mm, Z: ±0.3mm, T: ±40° |
| Standard holder |
Bulk: 5.0mm × 9.5mm × 3.5mmH |
| Cross-section: 2.0mm × 6.0mm × 5.0mmH |
| Dedicated holder |
Cross-section specimen holder: 2.0mm × 12.0mm × 6.0mmH |
| Double tilt cross-section specimen holder(L) : 0.8mm × 8.5mm × 3.5mmH |
| Detector |
Detector |
Secondary electron detector |
| Top detector (option) |
| BF/DF Duo-STEM detector (option) |
| Energy dispersive X-ray detector (option) |
| Image display |
Monitor |
24.1 type wide screen LCD (subject to change without notice) |
| Full screen display |
1,280 × 960pixels |
| Single (Dual display) |
800 × 600pixels (800 × 600pixcels × 2) |
| Quad screen display |
640 × 480pixels × 4 |
| Display system |
OS |
Windows®7(*3) |
| Operation system |
Mouse, Keyboard, Rotary Knob, Stage controller (Trackball and Joystick combined) |
| Image data saving |
640 × 480pixels, 1,280 × 960pixels, 2,560 × 1,920pixels, 5,120 × 3,840pixels |
| Saved image data management |
SEM data manager (image database / image processing function) included |
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(*1):1 at 127mm × 95mm (4" × 5" Polaroid size)
(*2):2 at 345mm × 259mm (1280 × 960pixels)
(*3):Windows®7 is a registered trademark of U.S. Microsoft Corp. in U.S.A and other countries
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