nanoart : Hitachi High-Technologies Corporation

Micro-hat

Yasushi Kuroda, Takahiro Sato, Kiyomi Kawasaki (Hitachi Science Systems, Ltd.)

Hiroyuki Tanaka (Instruments, Hitachi, Ltd.)

Fantasy in semiconductor device. The micrograph shows a micro-hat made from W(tungsten) with a ribbon made from Titanium nitride.
At 57th photo contest hosted by the Japanese Society of Electron Microscopy in 2001.

Specimen : 64M DRAM
Instrument : Ultra-thin Film Evaluation System HD-2000
Magnification : X 100,000
Accelerating voltage : 200 kV

All information related to these photographers is based on the information when the photo was taken.
This work was presented at the "photo contest" hosted by the Japanese Society of Microscopy.
Reproduction or republication without permission prohibited.
"nanoart" is registered trademark of Hitachi High-Technologies Corporation in Japan.
Copyright and Link policy.