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Sapporo nano Tower


Sapporo nano Tower
copyright Yasushi Kuroda, Toshie Yaguchi, Tsuyoshi Ohnishi (Hitachi High-Technologies corporation)
copyright Yuka Nishimoto (Hitachi High-Tech Fielding corporation)
The micrograph shows a secondary electron (SE) image of the world's smallest tower prepared by a FIB (Focused Ion Beam) technique.
The specimen is extracted from a Si wafer by using a micro-sampling method and mounted on a needle stab of a specimen rotation holder. A towered shape is made by rotating the specimen. Although the FIB was initially developed for fixing and evaluation of semiconductor devices, such micromanipulation technologies have been made a further progress.

First Place (Field 1: Non-biology)
At the 16th International Microscopy Congress (IMC16), Micrograph Competition (2006).

Condition

  • All information related to these photographers is based on the information when the photo was taken.
  • This work was presented at the 16th International Microscopy Congress (IMC16), Micrograph Competition.
  • Reproduction or republication without permission prohibited.
  • "nanoart" is registered trademark of Hitachi High-Technologies Corporation in Japan.
  • Copyright and Link policy.
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