Mild Sputter E-1045 : Hitachi High-Technologies Corporation

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	Mild Sputter E-1045

	One-touch operation has been realized with adopting the LCD touch panel. Specimen damage, average coating, particle diameter have been minimized through adoption of the magnetron type electrode.

Features

Adopting the LCD touch panel make it easy to set the condition of discharge current and coated time etc..
New recipe function enable to store up to five processing conditions in memory.
Compact design and space-saving (smaller than E-1030).

Specifications

Item		Description
Discharge	Type	Diode discharge magnetron type (electric field perpendicular to magnetic field)
	Electrode form	Opposed parallel disk (magnet embedded)
	Voltage	0.4 kV DC max. (variable through phase control)
	Current	40 mA DC max.
Coating rate (max.) [Conditions] Pressure : 7 Pa Discharge current : 40mA Distance between target and specimen surface : 20 mm	Pt target	15nm/min
	Pt-Pd target (option)	20nm/min
	Au target (option)	35nm/min
	Au-Pd target (option)	25nm/min
Pressure regulation range		7 to 20Pa
Specimen	Max. diameter	60mm
Specimen	Max. height	20mm
Rotary pump		135/162L/min (50/60Hz)
Target^(*1)		Pt , Pt-Pd (8:2) , Au , Au-Pd (6:4)
Power supply requirements		Single phase, 100V AC (±10%) 12.5A (50/60Hz), 3P outlet (with class D grounding)
Dimensions	Width	450mm
	Depth	442mm
	Height	400mm
Weight		Main unit : Approx. 25 kg Rotary pump : Approx. 28 kg

^(*1):Standard target is Pt. ( ) shows component ratio.

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