Transmission Electron Microscope H-9500 : Hitachi High-Technologies Corporation

	Atomic resolution 300kV transmission electron microscope Atomic resolution electron microscopy is becoming increasingly important and indispensable for the R&D of semiconductors and advanced materials where micro-fabrication technologies have entered into the sub-nanometer realm. In response to this high demand, Hitachi High Technologies, Inc. has developed the H-9500 transmission electron microscope with field proven high performance in high resolution transmission electron microscopy in addition to a number of user-friendly unique functions. The latest digital technology is incorporated to facilitate obtaining atomic level structural information in a timely manner.

Features

User-friendly operation

Windows^®^(*) compatible GUI design
High specimen throughput, 1 minute for specimen exchange and 5 minutes for voltage ramp up (300kV) and beam on.

Stable high resolution microscopy

Point-to-point resolution of 0.18nm and lattice resolution of 0.1nm
A stable 5-axis eucentric goniometer stage

Excellent performance reliability

Field-proven 10-stage accelerator gun design
High voltage resistor cable design

Valuable optional accessories

Compatible specimen holder for use with Hitachi TEM, FIB and STEM systems
A variety of specimen holders that provide heating, cooling and gas-injection capabilities for atomic resolution dynamic studies.

Note: Images on the FPD (flat panel display) are simulated.
^(*):Windows^® is a resistered trademark of Microsoft Corp., USA and other countries.

Specifications

Resolution		0.10nm (lattice) 0.18nm (point-to-point)
Accelerating voltage		300kV, 200kV^(1), 100kV^(1)
Magnification	Zoom mode	1,000 - 1,500,000×
	SA mode	4,000 - 500,000×
	Low mag mode	200 - 500×
Erectron gun	Filament	LaB₆ (DC heating)
	Filament exchange	Automated gun lift
	High voltage cable	Resistor cable
Illumination system	Lens	4-stage lens system
	Condenser aperture	Click-stop 4-openings
	Probe size	Micro mode: 0.05 - 0.2 µm (4 steps) Nano mode: 1 - 10 nm (4 steps)
	Beam tilt	±3°
Imaging system	Lens	5-stage lens system
	Focusing	Image wobbler Astigmatism correction by stigmonitor Optimum focus
	Objective aperture	Click-stop 4-openings
	Selected area aperture	Click-stop 4-openings
Erectron diffraction		Selected-area electron diffraction Nano probe electron dilfraction Convergent-beam electron diffraction
Erectron diffraction	Camera length	250 - 3,000mm
Specimen chamber	Specimen stage	Eucentric 5-axis Hiper goniometer stage
	Specimen size	3mmΦ
	Stage translation	X/Y = ±1mm, Z = ±0.3mm Motor drive by CPU control
	Specimen position display	Auto-drive, Auto-trace
	Specimen tilt	α = ±15°, β = ±15° (Hitachi double tilt specimen holder^(*2))
	Anti-contamination	Cold block
	Baking function	Mild baking function
Viewing chamber	Fluorescent screen	Main screen: 110mmΦ Focusing screen: 30mmΦ
Viewing chamber	Optical viewer	7.5×
Camera chamber	Field selection	Full/half exposure
Camera chamber	Film	25 sheets (2 sets of film magazines)
GUI		OS: Windows XP^®^(*3)
	Monitor	19 inch monitor
	Functions	Database, measurement, image processing
Digital CCD camera^(*4)	Camera coupling	Lens coupling
	Effective pixels	1,024 × 1,024 pixels
	A/D resolution	12 bits
Vacuum system	Electron gun	Ion pump: 60L/s
	Column	TMP: 260L/s
	Viewing/camera chamber	Diffusion pump: 280L/s Fore pump: 135L/min. × 3 sets

^(*1):Magnification is calibrated as an option
^(*2):An optional item
^(*3):Windows XP is a registered trademark of Microsoft Corp., in USA and in other countries
^(*4):This specification applies to an optional 1024 × 1024 pixel digital CCD-camera.

The above specifications are guaranteed at an accelerating voltage of 300kV