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LE0100S Exposure System for Large Scale Glass Substrate |
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XY step proximity exposure system for 7th generation |
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A XY step proximity high productivity exposure system designed for 7th generation color filter substrate. An original photo mask bending correction mechanism allows high precision exposure.
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Features |
- Target large scale substrate
Max.1950mm x 2250mm
- Adopting double chuck stage system, the transferring time of glass substrate can be reduced.
- Proximity gap control
Original optical non-contact gap control mechanism.
- Auto alignment
High speed and high accuracy by image recognition.
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