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LE0200SD Exposure System for Large Scale Glass Substrate
XY step proximity exposure system for 8th generation
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Picture of LE0200SD

A XY step proximity high productivity exposure system designed for 8th generation color filter substrate. An original photo mask bending correction mechanism allows high precision exposure.
High productivity and high precision proximity exposure system for color filter process.
LE0202SD is in the line-up for BM use.

 

Features
 
  • Target large scale substrate
    Max.2200mm x 2500mm
  • Adopting double chuck stage system, the transferring time of glass substrate can be reduced.
  • Mask size for next generation standard
    850mm x1400mm x t10mm
    1220mm x1400mm x t13mm
 
 
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