LE4000A Exposure System for Large Size Glass Substrate : Hitachi High-Technologies Corporation

A high speed proximity exposure system for volume production of color filter substrate.
An original precision optical alignment mechanism and high speed, precision proximity gap control, coupled with a personal computer to manage data, achieves high throughput and high reliability.

Features

High throughput
18sec./plate(except exposure time)
High resolution
Automatic alignment and proximity gap control
Automatic plate size change over
Non contact pre-alignment
Substrate size
Max.400mm x 500mm
Applicable to inline