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LE5565A Exposure System for Large Size Glass Substrate

An exposure system for 3rd generation large color filter substrate
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A proximity exposure for 3rd generation color filter substrate in volume production.
An original mechanisms coupled with technology and a design that maintains cleanliness, and temperature control that increase productivity and quality.

 

Features

 
  • Pre-alignment
  • Proximity gap control
    An original non-contact optical gap control is adopted.
  • Alignment
    A high precision, high speed alignment is achieved by using a linear image sensor.
  • Substrate size
    Max.650mm x 750mm
 
 

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