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LE8000 Series Exposure System for Large Size Glass Substrate |
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Proximity exposure system for 4th generation color filter |
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A proximity exposure for 4th generation color filter substrate in volume production. Available in single exposure or step and repeat exposure models. |
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Features |
- Large size exposure light source realize large area exposure with precision
- Adopted temperature control and cleaning function for photo mask and mother glass, high exposure accuracy and high yield rate can be achieved
- Compensation mechanism for photo mask bending, the exposure accuracy is improved
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