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LE9100S Exposure System for Large Size Glass Substrate
XY step proximity exposure system for 5th generation
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Picture of LE9100S

A XY step proximity exposure system designed for 5th generation color filter substrates. An original photo mask bending correction mechanism allows high precision exposure.
 

Features
 
  • Target large scale substrate
    Max.1100mm x 1300mm
  • High throughput
    (except exposure time)
    32sec./glass(4shots)
    40sec./glass(6shots)
  • Photo mask bending correction by an original mechanism
  • High resolution 8maicrom
 
 
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