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LE9300S Exposure System for Large Scale Glass Substrate |
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XY step proximity exposure system for 6th generation |
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A XY step proximity high productivity exposure system designed for 6th generation color filter substrate. An original photo mask bending correction mechanism allows high precision exposure. |
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Features |
- Target large scale substrate
Max.1500mm x 1850mm
- Photo mask bending correction by an original mechanism
- Proximity gap control
Original optical non-contact gap control mechanism.
- Auto alignment
High speed and high accuracy by image recognition.
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